The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2024

Filed:

Apr. 19, 2019
Applicant:

Showa Denko K.k., Tokyo, JP;

Inventor:

Isao Murase, Tochigi, JP;

Assignee:

SHOWA DENKO K.K., Tokyo, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C22C 21/06 (2006.01); C22F 1/05 (2006.01); C23C 28/04 (2006.01);
U.S. Cl.
CPC ...
C22C 21/06 (2013.01); C22F 1/05 (2013.01); C23C 28/04 (2013.01);
Abstract

Provided is an aluminum alloy member for forming a fluoride film thereon, the fluoride film being excellent in smoothness without occurrence of a black dot-shaped bulged portion and excellent in corrosion resistance against corrosive gas and plasma, etc. The aluminum alloy member for forming a fluoride film thereonfor use in a semiconductor producing apparatus consists of Si: 0.3 mass % to 0.8 mass %; Mg: 0.5 mass % to 5.0 mass %; Fe: 0.05 mass % to 0.5 mass %; Cu: 0 mass % or more and 0.5 mass % or less; Mn: 0 mass % or more and 0.30 mass % or less; Cr: 0 mass % or more and 0.30 mass % or less 0.5 mass % or less; and the balance being Al and inevitable impurities. When an average major diameter of a Fe-based crystallized product in the aluminum alloy member is D (μm), and an average crystalline particle diameter in the aluminum alloy member is Y (μm), a relation expression of logY←0.320D+4.60 is satisfied. A fluoride filmis formed on at least a part of a surface of the aluminum alloy memberfor forming a fluoride film thereon.


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