The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Mar. 01, 2018
Osaka University, Suita, JP;
Akira Harada, Suita, JP;
Hiroyasu Yamaguchi, Suita, JP;
Yoshinori Takashima, Suita, JP;
Suguru Nomimura, Suita, JP;
Hikaru Aramoto, Suita, JP;
Ryohei Ikura, Suita, JP;
Yuichiro Kobayashi, Suita, JP;
Yukie Nakamitsu, Suita, JP;
OSAKA UNIVERSITY, Suita, JP;
Abstract
Provided are a host-group-containing polymerizable monomer usable as a starting material for producing a macromolecular material with a high degree of freedom in material design, and excellent toughness and strength; a macromolecular material produced using the host-group-containing polymerizable monomer; and a method for producing the macromolecular material. The host-group-containing polymerizable monomer according to the present invention is a host-group-containing polymerizable monomer, and the host group is a monovalent group formed by removing one hydrogen atom or hydroxy group from a cyclodextrin derivative. The cyclodextrin derivative has such a structure that the hydrogen atom of at least one hydroxy group of a cyclodextrin is replaced with a group selected from the group consisting of a hydrocarbon group, an acyl group, and —CONHR wherein R represents a methyl group or an ethyl group.