The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Jun. 27, 2019
Planmeca Oy, Helsinki, FI;
Tero Rakkolainen, Helsinki, FI;
Juha Koivisto, Helsinki, FI;
Abstract
A stereolithography apparatus () has an exposure arrangement (), comprising a radiative element (); a masking element (), having a substantially rectangular masking area (); an optical path () between the radiative element () and the masking area (), having a linear segment (); and an intensity-unifying arrangement (), having a first, a second, a third, and a fourth reflective surface () The first and second reflective surfaces (,) are arranged on opposite sides of the linear segment (), and the third and fourth reflective surfaces () are arranged on opposite sides of the linear segment (). In a cross section of the intensity-unifying arrangement () along any plane, perpendicularly intersecting the linear segment (), the reflective surfaces () follow a boundary () of a rectangle.