The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Mar. 05, 2020
Beijing University of Chemical Technology, Beijing, CN;
Yong Luo, Beijing, CN;
Di Wang, Beijing, CN;
Guangwen Chu, Beijing, CN;
Yachao Liu, Beijing, CN;
Zhihao Li, Beijing, CN;
Yong Cai, Beijing, CN;
Haikui Zou, Beijing, CN;
Baochang Sun, Beijing, CN;
Jianfeng Chen, Beijing, CN;
BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY, Beijing, CN;
Abstract
The present application provides a high-gravity device for generating nano/micron bubble and a reaction system. In the device, the liquid phase is continuous phase and the gas phase is dispersed phase. A gas enters the interior of the device from a hollow shaft, and the gas is subjected to primary shearing under a shearing effect of aerating micropores to form bubbles; then, the bubbles rapidly disengage from the surface of a rotating shaft under the effect of the rotating shaft rotating at a high speed, and are subjected to secondary shearing under the high-gravity environment with the strong shearing force formed by the rotating shaft to form nano/micron bubbles. The device has the advantages of fastness, stability, and small average particle size. The average particle size of the formed nano/micron bubbles is between 800 nanometers and 50 microns, and the average particle size of the bubbles can be regulated in a range by adjusting the rotating speed of the rotating shaft.