The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2024
Filed:
Dec. 17, 2021
Applicant:
General Hydrogen Corp., Ltd., Shenzhen, CN;
Inventor:
Keguang Yao, Shenzhen, CN;
Assignee:
General Hydrogen Corp., Ltd., Shenzhen, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/88 (2006.01); H01M 4/86 (2006.01);
U.S. Cl.
CPC ...
H01M 4/8807 (2013.01); H01M 4/8605 (2013.01); H01M 4/8657 (2013.01); H01M 4/8673 (2013.01); H01M 4/8885 (2013.01);
Abstract
Disclosed are a gas diffusion layer and a method for preparing the same. In the preparation method, a conductive material is fed to a carbon fiber suspension slurry to obtain a carbon fiber substrate. The carbon fiber substrate is processed to obtain a conductive porous substrate. A hydrophobic layer is formed on the conductive porous substrate to obtain a hydrophobic-conductive porous substrate. Then a microporous layer is formed on the hydrophobic-conductive porous substrate to obtain the gas diffusion layer.