The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2024

Filed:

Jun. 14, 2023
Applicant:

Diodes Incorporated, Plano, TX (US);

Inventors:

Kolins Chao, Zhubei, TW;

John Huang, New Taipei, TW;

Assignee:

DIODES INCORPORATED, Plano, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/417 (2006.01); H01L 23/00 (2006.01); H01L 29/40 (2006.01); H01L 29/872 (2006.01);
U.S. Cl.
CPC ...
H01L 29/417 (2013.01); H01L 24/13 (2013.01); H01L 29/404 (2013.01); H01L 29/407 (2013.01); H01L 29/8725 (2013.01); H01L 2224/13021 (2013.01); H01L 2224/13144 (2013.01); H01L 2224/13155 (2013.01);
Abstract

A method for forming a semiconductor Schottky rectifier device includes providing a semiconductor substrate, forming a hard mask for trench etch including openings for guard rings, an anode region, and a cathode region, and etching semiconductor epitaxial material layer to form a plurality of trenches. The method also includes forming a first dielectric layer and depositing a polysilicon layer, performing an anisotropic etch of the polysilicon layer to form polysilicon elements on sidewalls of the trench, and depositing and etching a second dielectric layer to expose a Schottky diode region and a bottom region of the trench in the cathode region. The method further includes depositing a first metal layer and performing a thermal treatment to form metal silicide in the Schottky diode region and the cathode region and forming a second metal layer and separating the second metal layer into an anode electrode and a cathode electrode.


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