The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2024

Filed:

Feb. 28, 2019
Applicant:

Tianjin University, Tianjin, CN;

Inventors:

Lei Ma, Tianjin, CN;

Walter Alexander De Heer, Tianjin, CN;

Peixuan Ji, Tianjin, CN;

Kaimin Zhang, Tianjin, CN;

Jian Zhao, Tianjin, CN;

Mei Zhao, Tianjin, CN;

Assignee:

TIANJIN UNIVERSITY, Tianjin, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 29/02 (2006.01); B28D 5/04 (2006.01); C30B 1/02 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02013 (2013.01); B28D 5/045 (2013.01); C30B 1/026 (2013.01); C30B 29/02 (2013.01); H01L 21/02378 (2013.01); H01L 21/02433 (2013.01); H01L 21/02527 (2013.01); H01L 21/0262 (2013.01);
Abstract

The present invention provides a control method to epitaxial growth monolayer graphene, in which a monolayer graphene is epitaxially grown on a non-polar crystal face at arbitrary angle of a non-polar crystal face SiC substrate, thereby utilizing the non-polar crystal face to manipulate the electrical transport properties of graphene. A monolayer graphene having ballistic transport properties can be epitaxially grown at arbitrary angle of non-polar crystal face SiC substrate by the above-mentioned control method.


Find Patent Forward Citations

Ma, Lei. (2024). Monolayer graphene on non-polar face sic substrate and control method thereof (U.S. Patent No. 12051585). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12051585

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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