The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2024
Filed:
Aug. 28, 2019
Hitachi High-tech Corporation, Tokyo, JP;
Kengo Asai, Tokyo, JP;
Hisayuki Takasu, Tokyo, JP;
Toru Iwaya, Tokyo, JP;
Tsutomu Tetsuka, Tokyo, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
Provided is an ion gun that is capable of obtaining a higher plasma efficiency. This ion gun comprises: a first cathodethat is formed in a disc shape; a second cathodethat is formed in a disc shape and has an ion beam extraction holeprovided thereto; a first permanent magnetthat is disposed between the first cathode and the second cathode, and that is formed in a cylindrical shape; an anodethat has a cylindrical regionand an extending regionprovided to one end of the cylindrical region; and an insulating materialthat keeps the anode electrically insulated from the first cathode, the second cathode, and the first permanent magnet, all of which are electrically connected. The cylindrical region of the anode is disposed inside the inner diametrical position of the first permanent magnet, and the extending region of the anode is disposed so as to cross over the inner diametrical position of the first permanent magnet and to face the first cathode.