The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2024
Filed:
Jun. 24, 2022
Ray clustering learning method based on weakly-supervised learning for denoising through ray tracing
Applicant:
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Inventors:
Assignee:
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, Daejeon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 15/00 (2006.01); G06N 3/08 (2023.01); G06T 5/70 (2024.01); G06T 15/06 (2011.01);
U.S. Cl.
CPC ...
G06T 15/06 (2013.01); G06N 3/08 (2013.01); G06T 5/70 (2024.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01);
Abstract
Disclosed is a ray clustering learning method based on weakly-supervised learning for denoising using ray tracing. The ray clustering learning method is for learning a denoising model for removing noise from a rendered image through ray tracing, and includes extracting a feature of a simulated ray through the ray tracing and clustering the ray through contrastive learning for the feature.