The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2024

Filed:

Jun. 15, 2018
Applicant:

Saint-gobain Glass France, Courbevoie, FR;

Inventors:

André Beyrle, Tracy le Val, FR;

Samuel Lepretre, Compiegne, FR;

Assignee:

SAINT-GOBAIN GLASS FRANCE, Courbevoie, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41M 1/34 (2006.01); B41C 1/14 (2006.01); B41M 1/12 (2006.01); B41N 1/24 (2006.01); H01L 21/67 (2006.01); H05B 3/84 (2006.01); H05B 3/86 (2006.01);
U.S. Cl.
CPC ...
B41M 1/34 (2013.01); B41C 1/14 (2013.01); B41M 1/12 (2013.01); B41N 1/247 (2013.01); H01L 21/6715 (2013.01); H05B 3/84 (2013.01); H05B 3/86 (2013.01); H05K 2203/304 (2013.01);
Abstract

A screen-printing screen for printing electrically conductive patterns on glass sheets, includes a main mask, the aperture size of the main mask being larger in a lateral portion than in the central portion, the screen furthermore including, in at least one double-mask zone, located in the central portion, at least one secondary mask fastened to a face of the main mask, the aperture size of the or each secondary mask being larger than the aperture size of the main mask in the central portion, and the mesh of the or each secondary mask making, with the mesh of the main mask, an angle α comprised between 1 and 89°.


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