The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2024

Filed:

Oct. 20, 2022
Applicants:

Smith & Nephew, Inc., Memphis, TN (US);

Smith & Nephew Asia Pacific Pte. Limited, Singapore, SG;

Smith & Nephew Orthopaedics Ag, Zug, CH;

Inventor:

Hubert Götte, Feldkirchen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 34/10 (2016.01); A61F 2/30 (2006.01); A61F 2/38 (2006.01); A61F 2/46 (2006.01);
U.S. Cl.
CPC ...
A61B 34/10 (2016.02); A61F 2/38 (2013.01); A61F 2/4657 (2013.01); A61B 2034/104 (2016.02); A61B 2034/107 (2016.02); A61B 2034/108 (2016.02); A61F 2002/30616 (2013.01); A61F 2002/4633 (2013.01);
Abstract

A computer-implemented method for determining implant positions of two implant components relative to two bones that form a joint is disclosed. The method includes acquiring a set of target poses to be achieved between the two bones, assessing one or more proposed implant arrangements using the set of target poses, and selecting an implant arrangement from the proposed implant arrangements based on the assessment. Assessing an implant arrangement includes determining a real pose between the two bones for each target pose, calculating a pose deviation value for each target pose based on the target pose and the corresponding real pose, and calculating an overall pose deviation value from the individual pose deviation values. The implant arrangement may be selected based on the overall pose deviation values for the proposed implant arrangements.


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