The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2024
Filed:
Nov. 24, 2022
Nidec Copal Corporation, Tokyo, JP;
Fujifilm Corporation, Tokyo, JP;
Sena Amemiya, Tokyo, JP;
Masaki Takamatsu, Kanagawa, JP;
Jumpei Shiraishi, Kanagawa, JP;
Kyohei Shibuya, Kanagawa, JP;
NIDEC COPAL CORPORATION, Tokyo, JP;
FUJIFILM CORPORATION, Tokyo, JP;
Abstract
An inspection device includes a small shutter in an opening of an inspection chamber, and a large shutter behind the small shutter. The small shutter has a closed state, an inward-open state, and an outward-open state. The small shutter in the inward-open or outward-open state is pushed by a workpiece and pivots inward in or outward from the inspection chamber. The large shutter has a light-shielding state, a driven state, and a stationary state. The large shutter in the light-shielding state overlaps the small shutter in the closed state and closes a clearance between the opening and the small shutter. The large shutter in the driven state is pushed by the small shutter in the inward-open state and pivots with the small shutter. The large shutter in the stationary state is separate from the small shutter in the outward-open state and at a same position as in the light-shielding state.