The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2024

Filed:

May. 10, 2021
Applicant:

Kioxia Corporation, Tokyo, JP;

Inventors:

Yoshinori Kitamura, Tsu, JP;

Katsuhiro Sato, Yokkaichi, JP;

Hiroaki Ashidate, Mie, JP;

Assignee:

Kioxia Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B01F 23/23 (2022.01); B05D 1/18 (2006.01); B05D 1/34 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67086 (2013.01); B01F 23/23 (2022.01); B05D 1/18 (2013.01); B05D 1/34 (2013.01); H01L 21/31105 (2013.01); H01L 21/31111 (2013.01);
Abstract

According to embodiments, a substrate treatment apparatus includes a housing, a heater and a pipe. The housing stores solution containing phosphoric acid and houses a substrate including a silicon substrate. The heater heats the solution over a normal boiling point of the solution. The pipe supplies heated solution heated by the heater into the housing while generating air bubbles.


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