The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2024
Filed:
Jun. 04, 2021
GE Precision Healthcare Llc, Wauwatosa, WI (US);
Lei Gao, Beijing, CN;
Juan Gao, Beijing, CN;
Gaohong Wu, New Berlin, WI (US);
Yongchuan Lai, Beijing, CN;
GE PRECISION HEALTHCARE LLC, Wauwatosa, WI (US);
Abstract
A magnetic resonance (MR) imaging method of correcting nonuniformity in diffusion-weighted (DW) MR images of a subject is provided. The method includes applying a DW pulse sequence along a plurality of diffusion directions with one or more numbers of excitations (NEX), and acquiring a plurality of DW MR images of the subject along the plurality of diffusion directions with the one or more NEX. The method also includes deriving a reference image and a base image based on the plurality of DW MR images, generating a nonuniformity factor image based on the reference image and the base image, and combining the plurality of DW MR images into a combined image. The method also includes correcting nonuniformity of the combined image using the nonuniformity factor image, and outputting the corrected image.