The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2024

Filed:

May. 21, 2021
Applicant:

Mycronic Ab, Taby, SE;

Inventors:

Anders Svensson, Sollentuna, SE;

Fredric Ihren, Taby, SE;

Assignee:

Mycronic AB, Taby, SE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70491 (2013.01); G03F 7/70383 (2013.01);
Abstract

A method for obtaining a compensation pattern for a workpiece patterning device comprises printing (S) a calibration pattern with a plurality of simultaneously operating exposure beams being sweepable in a second direction according to calibration pattern print data having a multitude of edges. Positions of the edges are measured (S). Deviations of the measured positions relative calibration pattern are calculated (S). Each deviation is associated (S) with a used exposure beam, with a sweep position and a grid fraction position. Edge compensating data is computed (S) for adapting edge representations of pattern print data prior to printing to compensate for the calculated deviations. The edge compensating data is dependent on the used exposure beam, the sweep position, and the grid fraction position.


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