The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2024
Filed:
Dec. 13, 2022
Applicant:
Magic Leap, Inc., Plantation, FL (US);
Inventors:
Vikramjit Singh, Pflugerville, TX (US);
Michael Nevin Miller, Austin, TX (US);
Frank Y. Xu, Austin, TX (US);
Shuqiang Yang, Austin, TX (US);
Assignee:
Magic Leap, Inc., Plantation, FL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 1/118 (2015.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7015 (2013.01); G02B 1/118 (2013.01); G03F 7/0002 (2013.01);
Abstract
An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.