The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2024
Filed:
Nov. 13, 2020
Zhejiang University, Hangzhou, CN;
ZHEJIANG UNIVERSITY, Hangzhou, CN;
Abstract
The present invention discloses a method for suppressing reflection of binary grating image projection based on high-frequency pattern interference including generating multiple high-frequency patterns for reflection suppression; generating a binary grating for three-dimensional appearance measurement, wherein the binary grating is inverted to generate a reverse binary grating; generating multiple interfering binary gratings. The projection images of multiple interfering binary gratings projected by the projector and then collected by the camera are used as output images, and all output images are synthesized in a certain manner to obtain an output image after reflection suppression, which is used as a result of the binary grating image to be projected after reflection suppression. The invention effectively eliminates the wrong measurement result caused by reflection in the three-dimensional measurement of the binary grating projection method, and improves the accuracy of the three-dimensional appearance measurement based on the binary grating projection method.