The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2024
Filed:
Jun. 15, 2022
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Hyeongeu Kim, Phoenix, AZ (US);
Tom Kirschenheiter, Phoenix, AZ (US);
Eric Hill, Phoenix, AZ (US);
Mark Hawkins, Phoenix, AZ (US);
Loren Jacobs, Phoenix, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/52 (2006.01); C23C 16/24 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 16/24 (2013.01); C23C 16/4401 (2013.01); C23C 16/4411 (2013.01); C23C 16/4586 (2013.01);
Abstract
A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.