The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2024

Filed:

Mar. 09, 2021
Applicant:

Spts Technologies Limited, Newport, GB;

Inventors:

Scott Haymore, Newport, GB;

Adrian Thomas, Newport, GB;

Steve Burgess, Newport, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03H 3/08 (2006.01); C23C 14/16 (2006.01); C23C 14/35 (2006.01); H03H 9/02 (2006.01);
U.S. Cl.
CPC ...
C23C 14/165 (2013.01); C23C 14/351 (2013.01); H03H 3/08 (2013.01); H03H 9/02047 (2013.01); H03H 9/02574 (2013.01); H03H 9/02614 (2013.01);
Abstract

Sputter depositing a metallic layer on a substrate in the fabrication of a resonator device includes providing a magnetron sputtering apparatus comprising a chamber, a substrate support disposed within the chamber, a target made from a metallic material, and a plasma generating device, wherein the substrate support and the target are separated by a distance of 10 cm or less; supporting the substrate on the substrate support; performing a DC magnetron sputtering step that comprises sputtering the metallic material from the target onto the substrate so as to form a metallic layer on the substrate, wherein during the DC magnetron sputtering step the chamber has a pressure of at least 6 mTorr of a noble gas, the target is supplied with a power having a power density of at least 6 W/cm, and the substrate has a temperature in the range of 200-600° C.


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