The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2024

Filed:

Sep. 24, 2020
Applicant:

Raytheon Technologies Corporation, Farmington, CT (US);

Inventor:

Wayde R. Schmidt, Pomfret Center, CT (US);

Assignee:

RTX CORPORATION, Farmington, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 11/10 (2014.01); B28B 1/00 (2006.01); B29C 64/124 (2017.01); B33Y 10/00 (2015.01); B33Y 70/00 (2020.01); C01B 32/977 (2017.01); C08G 77/20 (2006.01); C09D 11/101 (2014.01); C09D 11/102 (2014.01); B29K 83/00 (2006.01);
U.S. Cl.
CPC ...
C09D 11/101 (2013.01); B28B 1/001 (2013.01); B29C 64/124 (2017.08); B33Y 10/00 (2014.12); B33Y 70/00 (2014.12); C01B 32/977 (2017.08); C08G 77/20 (2013.01); C09D 11/102 (2013.01); B29K 2083/00 (2013.01);
Abstract

A photo-curable liquid composition for additive manufacturing of silicon-containing carbide ceramic includes a polymethylvinylsilane (PMVS) resin that has photo-reactivity over a first photo-wavelength absorption range and a photo-initiator additive mixed with the PMVS resin. The photo-initiator additive has photo-reactivity over a second photo-wavelength absorption range that has an overlapping wavelength range with the first photo-wavelength absorption range. The PMVS and the photo-initiator additive are reactive to polymerize upon exposure to radiation having a wavelength in the overlapping wavelength range.


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