The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2024
Filed:
Jan. 06, 2023
Applicant:
Qingdao Pico Technology Co., Ltd., Qingdao, CN;
Inventor:
Zishang Wang, Beijing, CN;
Assignee:
QINGDAO PICO TECHNOLOGY CO., LTD., Qingdao, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 44/12 (2006.01); B32B 27/06 (2006.01); B32B 27/40 (2006.01); B29K 75/00 (2006.01); B29K 105/04 (2006.01); B29L 31/48 (2006.01); G02B 27/01 (2006.01);
U.S. Cl.
CPC ...
B29C 44/1276 (2013.01); B29C 44/1271 (2013.01); B32B 27/065 (2013.01); B32B 27/40 (2013.01); B29C 2793/009 (2013.01); B29K 2075/00 (2013.01); B29K 2105/04 (2013.01); B29L 2031/4835 (2013.01); G02B 27/0176 (2013.01);
Abstract
The present disclosure provides a VR face mask and a manufacturing method thereof. The VR face mask includes a mask body, and a first PU covering layer arranged on a surface of the mask body to be attached close to a human face. The mask body includes a mask bottom layer arranged away from the first PU covering layer, and a filling layer arranged between the first PU covering layer and the mask bottom layer.