The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2024

Filed:

Apr. 08, 2020
Applicant:

Amo Development, Llc, Irvine, CA (US);

Inventors:

Alexander Vankov, Mountain View, CA (US);

Jenny Wang, Mountain View, CA (US);

David A. Dewey, Sunnyvale, CA (US);

Phillip Gooding, Mountain View, CA (US);

Richard Hofer, Santa Cruz, CA (US);

Georg Schuele, Portola Valley, CA (US);

Assignee:

AMO Development, LLC, Irvine, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61F 9/008 (2006.01); G02B 26/10 (2006.01);
U.S. Cl.
CPC ...
A61F 9/00834 (2013.01); G02B 26/101 (2013.01); A61F 2009/00855 (2013.01); A61F 2009/0087 (2013.01); A61F 2009/00897 (2013.01);
Abstract

The XYZ beam position of an ophthalmic laser system is calibrated by measuring a fluorescent signal induced by the focused laser beam in a thin glass coverslip via multiphoton absorption. A video camera measures the XY position and intensity of the fluorescent signal as the focused laser beam strikes the coverslip. The Z position of the focus is determined by scanning the targeted z position and identifying the Z scanner position of peak fluorescence. An OCT system measures the real space Z location of the coverslip, which is correlated with the Z scanner position. Other laser system parameters are assessed by repeatedly scanning a lower energy laser beam in a piece of IOL material, and observing damage (scattering voids) formation in the IOL material. Based on the rate of damage formation, laser system parameters such as beam quality, numerical aperture, pulse energy, and pulse duration, etc. can be assessed.


Find Patent Forward Citations

Loading…