The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2024
Filed:
Nov. 25, 2020
Raytheon Company, Waltham, MA (US);
Allen J. Andreu, Tampa, FL (US);
Carlos R. Costas, Brandon, FL (US);
James W. Culver, Seminole, FL (US);
Daniel P. Jones, Pinellas Park, FL (US);
Ryan C. Lewandowski, Palm Harbor, FL (US);
Raytheon Company, Tewksbury, MA (US);
Abstract
An apparatus for mitigating element pattern ripple includes an inner cone, an outer cone, at least one driven element, and at least one director. The outer cone is coupled to the inner cone. The at least one driving element is coupled to the outer cone and is configured to produce at least one primary ray. The at least one director is coupled to the outer cone and is configured to direct the at least one primary ray. The inner cone and the outer cone may be concentric. The at least one driven element may include multiple driven elements. The at least one director may include multiple directors. A number of directors may be equal to a number of driven elements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile