The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2024
Filed:
Dec. 09, 2021
Ableprint Technology Co., Ltd., Miaoli County, TW;
Chih-Horng Horng, Hsinchu, TW;
ABLEPRINT TECHNOLOGY CO., LTD., Miaoli County, TW;
Abstract
Disclosed is a method for suppressing material warpage by increasing a gas density. The method comprises the following steps: a. placing a plurality of semiconductor elements in a processing chamber; b. increasing a temperature in the processing chamber to a first predetermined temperature and importing a gas, to increase pressure to predetermined pressure and apply the processing chamber in a high-temperature and high-pressure working environment; and performing an isothermal-isobaric process at the first predetermined temperature and the predetermined pressure, to improve temperature uniformity by the high pressure gas; and c. decreasing the temperature in the processing chamber from the first predetermined temperature to a second predetermined temperature and continuing to import the gas into the processing chamber, to maintain the processing chamber at the predetermined pressure; and performing a cooling and isobaric process on each semiconductor element, to suppress warpage of each semiconductor element.