The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2024

Filed:

Jul. 30, 2019
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Shota Umeda, Tokyo, JP;

Kenji Tamaki, Tokyo, JP;

Masahiro Sumiya, Tokyo, JP;

Masaki Ishiguro, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); G01M 99/00 (2011.01); G06N 7/01 (2023.01);
U.S. Cl.
CPC ...
H01J 37/32917 (2013.01); G01M 99/005 (2013.01); G06N 7/01 (2023.01); H01J 2237/24578 (2013.01);
Abstract

In a diagnosis apparatus for diagnosing a state of a plasma processing apparatus, prior distribution information including a probability distribution function is previously obtained for each of first sensors by using first sensor values obtained by the first sensors in a first plasma processing apparatus, a probability distribution in each of second sensors corresponding to each of the first sensors is estimated based on the previously obtained prior distribution information and second sensor values obtained by the second sensors in a second plasma processing apparatus different from the first plasma processing apparatus, and a state of the second plasma processing apparatus is diagnosed by using the estimated probability distribution.


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