The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2024

Filed:

Sep. 30, 2019
Applicant:

Amazon Technologies, Inc., Seattle, WA (US);

Inventors:

Andrea Olgiati, Gilroy, CA (US);

Lakshmi Naarayanan Ramakrishnan, Redmond, WA (US);

Jeffrey John Geevarghese, Issaquah, WA (US);

Denis Davydenko, Sunnyvale, CA (US);

Vikas Kumar, San Jose, CA (US);

Rahul Raghavendra Huilgol, Sunnyvale, CA (US);

Amol Ashok Lele, Sunnyvale, CA (US);

Stefano Stefani, Issaquah, WA (US);

Vladimir Zhukov, Seattle, WA (US);

Assignee:

Amazon Technologies, Inc., Seattle, WA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06N 20/00 (2019.01); G06N 5/04 (2023.01); G06N 5/046 (2023.01); G06F 11/36 (2006.01);
U.S. Cl.
CPC ...
G06N 20/00 (2019.01); G06N 5/046 (2013.01); G06F 11/36 (2013.01);
Abstract

Methods, systems, and computer-readable media for debugging and profiling of machine learning model training are disclosed. A machine learning analysis system receives data associated with training of a machine learning model. The data was collected by a machine learning training cluster. The machine learning analysis system performs analysis of the data associated with the training of the machine learning model. The machine learning analysis system detects one or more conditions associated with the training of the machine learning model based at least in part on the analysis. The machine learning analysis system generates one or more alarms describing the one or more conditions associated with the training of the machine learning model.


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