The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2024
Filed:
Jul. 28, 2020
Applicant:
Unist (Ulsan National Institute of Science and Technology), Ulsan, KR;
Inventor:
Jiseok Lee, Ulsan, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/18 (2006.01); C08J 3/075 (2006.01); C08J 3/28 (2006.01); G03F 7/00 (2006.01); G03H 1/02 (2006.01);
U.S. Cl.
CPC ...
G03H 1/18 (2013.01); C08J 3/075 (2013.01); C08J 3/28 (2013.01); G03F 7/001 (2013.01); G03F 7/7005 (2013.01); G03F 7/70283 (2013.01); C08J 2335/02 (2013.01); G03H 2001/0264 (2013.01); G03H 2001/185 (2013.01); G03H 2224/00 (2013.01); G03H 2260/12 (2013.01); G03H 2260/14 (2013.01);
Abstract
A method of manufacturing a holographic pattern-expressing organogel, by using a dithering mask, according to an aspect of the present disclosure includes: preparing a dithering mask including white pixels and black pixels arranged in periodic patterns; photocuring a polymer by passing an ultraviolet ray through the dithering mask; passing a first solvent through the cured polymer; and passing a second solvent through the cured polymer through which the first solvent is passed.