logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12038689 B1

PDFFull Text
Date of Patent:
Jul. 16, 2024

Filed:

Mar. 25, 2021

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Akihiro Kaneko, Haibara-gun, JP;

Kazunari Yagi, Haibara-gun, JP;

Takashi Kawashima, Haibara-gun, JP;

Akiyoshi Goto, Haibara-gun, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08F 212/14 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); C08F 220/36 (2006.01); C09D 125/18 (2006.01); C09D 133/10 (2006.01); C09D 133/16 (2006.01); G03F 7/004 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C08F 212/22 (2020.02); C08F 220/1808 (2020.02); C08F 220/1809 (2020.02); C08F 220/1812 (2020.02); C08F 220/1818 (2020.02); C08F 220/281 (2020.02); C08F 220/282 (2020.02); C08F 220/283 (2020.02); C08F 220/365 (2020.02); C09D 125/18 (2013.01); C09D 133/10 (2013.01); C09D 133/16 (2013.01); G03F 7/0045 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01); G03F 7/30 (2013.01); G03F 7/38 (2013.01);
Abstract

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes an acid-decomposable resin having a repeating unit represented by General Formula (1), and a compound that generates an acid upon irradiation with actinic rays or radiation.

Find Patent Forward Citations

Loading…