The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2024
Filed:
Jun. 23, 2020
Magic Leap, Inc., Plantation, FL (US);
Ling Li, Cedar Park, TX (US);
Chieh Chang, Cedar Park, TX (US);
Sharad D. Bhagat, Austin, TX (US);
Christophe Peroz, San Francisco, CA (US);
Brian George Hill, Duxbury, MA (US);
Roy Matthew Patterson, Hutto, TX (US);
Satish Sadam, Round Rock, TX (US);
Magic Leap, Inc., Plantation, FL (US);
Abstract
A method of aligning a stencil to an eyepiece wafer includes providing the stencil, positioning the stencil with respect to a first light source, and determining locations of at least two stencil apertures. The method also includes providing the eyepiece wafer. The eyepiece wafer includes at least two eyepiece waveguides, each eyepiece waveguide including an incoupling grating and a corresponding diffraction pattern. The method further includes directing light from one or more second light sources to impinge on each of the corresponding diffraction patterns, imaging light diffracted from each incoupling grating, determining at least two incoupling grating locations, determining offsets between corresponding stencil aperture locations and incoupling grating locations, and aligning the stencil to the eyepiece wafer based on the determined offsets.