The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2024
Filed:
Jan. 21, 2019
Daicel Corporation, Osaka, JP;
Takahiro Sakakibara, Tokyo, JP;
Masashi Yokoyama, Tokyo, JP;
DAICEL CORPORATION, Osaka, JP;
Abstract
An anti-reflection film (X) includes a laminated structure including a substrate (), a hard coat layer (), and an anti-reflection layer (), and a luminous reflectance of the anti-reflection layer () side is 2% or less. A minimum value of a mandrel diameter indicating the bending resistance is in a range of 6 mm or less in a bending test according to a cylindrical mandrel method in which the test piece of the anti-reflection film (X) is bent with the anti-reflection layer () side inward. Additionally or alternatively, a minimum value of the mandrel diameter indicating the bending resistance is in a range of 10 mm or less in a bending test according to a cylindrical mandrel method in which the test piece of the anti-reflection film (X) is bent with the anti-reflection layer () side outward. Such an anti-reflection film is suitable for achieving high bending resistance together with high anti-reflective properties.