The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2024
Filed:
Sep. 02, 2019
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Pilsung Jo, Daejeon, KR;
Yong Chan Kim, Daejeon, KR;
Song Ho Jang, Daejeon, KR;
Ki Hwan Kim, Daejeon, KR;
Nansra Heo, Daejeon, KR;
Jeong Woo Shon, Daejeon, KR;
Assignee:
LG Chem, Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/14 (2006.01); B44C 1/22 (2006.01); C03C 17/36 (2006.01); C23C 14/34 (2006.01); C23C 14/58 (2006.01); G02B 5/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/14 (2013.01); B44C 1/227 (2013.01); C03C 17/3626 (2013.01); C03C 17/3649 (2013.01); C03C 17/3657 (2013.01); C23C 14/34 (2013.01); C23C 14/5873 (2013.01); C03C 2217/268 (2013.01); C03C 2217/281 (2013.01); C03C 2217/72 (2013.01); C03C 2218/154 (2013.01); C03C 2218/33 (2013.01); G02B 5/003 (2013.01);
Abstract
The present disclosure relates to a method for manufacturing a decoration element, the method including depositing a light reflective layer having a structure of two or more islands separated from each other on one surface of a light absorbing layer; and dry etching the light absorbing layer using the island as a mask, wherein a resistance value of the decoration element after the dry etching of the light absorbing layer increases by two times or more compared to before the dry etching of the light absorbing layer.