The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2024

Filed:

Jun. 22, 2020
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Heung Kwon Bae, Daejeon, KR;

Hyun Min Lee, Daejeon, KR;

Kyung Seog Youk, Daejeon, KR;

Joong Chul Lim, Daejeon, KR;

Se Woong Lee, Daejeon, KR;

Jung Rae Lee, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 6/00 (2006.01); C08F 2/01 (2006.01); C08F 6/16 (2006.01); C08F 14/06 (2006.01);
U.S. Cl.
CPC ...
C08F 6/16 (2013.01); C08F 2/01 (2013.01); C08F 6/003 (2013.01); C08F 6/008 (2013.01); C08F 14/06 (2013.01);
Abstract

The present invention provides a post-treatment method of a vinyl chloride-based polymer including: (a) preparing a stream containing vinyl chloride-based polymer powder and unreacted vinyl chloride-based monomers by drying a vinyl chloride-based polymer latex in a drying unit; (b) filtering the stream containing the vinyl chloride-based polymer powder and the unreacted vinyl chloride-based monomers in a filtering unit; and (c) recirculating a gas containing the unreacted vinyl chloride-based monomers discharged from the filtering unit to a latex storage unit.


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