The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2024

Filed:

Jun. 30, 2022
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Tomoyuki Shinohara, Kyoto, JP;

Junichi Ishii, Kyoto, JP;

Kazuki Nakamura, Kyoto, JP;

Yoshifumi Okada, Kyoto, JP;

Takuma Takahashi, Kyoto, JP;

Takashi Shinohara, Kyoto, JP;

Nobuaki Okita, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 13/00 (2006.01); B08B 1/20 (2024.01); B08B 3/02 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
B08B 1/20 (2024.01); B08B 3/022 (2013.01); H01L 21/67051 (2013.01); H01L 21/68764 (2013.01);
Abstract

A cleaner comes into contact with a lower-surface center region of a substrate held by a first holder, so that the lower-surface center region is cleaned. The cleaner comes into contact with a lower-surface outer region of the substrate rotated by a second holder, so that the lower-surface outer region of the substrate is cleaned. During cleaning of the lower-surface center region, the second holder is rotated about a vertical axis while not holding the substrate. Alternatively, during cleaning of the lower-surface center region, the gas injector arranged between the cleaner and the second holder injects gas toward the substrate from a first height spaced apart from the substrate by a predetermined distance. Further, during drying of the lower-surface center region, the gas injector injects gas toward the substrate from a second height closer to the substrate than the first height.


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