The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2024
Filed:
Oct. 26, 2021
Applicant:
Hitachi, Ltd., Tokyo, JP;
Inventors:
Yuki Watanabe, San Jose, CA (US);
Ravigopal Vennelakanti, San Jose, CA (US);
Rahul Vishwakarma, Sunnyvale, CA (US);
Assignee:
HITACHI, LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G06V 20/52 (2022.01); G06V 20/40 (2022.01); G06V 20/54 (2022.01);
U.S. Cl.
CPC ...
G06V 20/53 (2022.01); G06V 20/49 (2022.01); G06V 20/54 (2022.01);
Abstract
Example implementations described herein involve an attribute of an inflow source that is assigned to each trajectory in the camera view, which is used for crowd analysis. The inflow source is estimated using techniques of tracking across cameras. If the inflow source is different even if the flow trajectories are the same direction, the trajectories are visualized in different styles. By using the attribute of the inflow source, it is possible to detect changes and anomalies in the crowd that were difficult to detect using the prior art.