The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2024

Filed:

Apr. 19, 2021
Applicant:

Leia Inc., Menlo Park, CA (US);

Inventors:

David A. Fattal, Menlo Park, CA (US);

Joseph D. Lowney, Menlo Park, CA (US);

Thomas Hoekman, Menlo Park, CA (US);

Assignee:

LEIA INC., Menlo Park, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 30/33 (2020.01); F21V 8/00 (2006.01); H04N 9/31 (2006.01);
U.S. Cl.
CPC ...
G02B 30/33 (2020.01); G02B 6/0051 (2013.01); H04N 9/3197 (2013.01);
Abstract

A multiview backlight and multiview display employ an optical mask element having a first portion and a laterally displaced second portion to mitigate Moiré associated with the optical mask element. The multiview backlight includes an array of multibeam unit cells distributed across a light guide. Each multibeam unit cell has a multibeam element configured to scatter out a portion of guided light as a plurality of directional light beams having different directions corresponding to different views of the multiview display. Each multibeam unit cell further includes an optical mask element having the first portion aligned and co-extensive with the multibeam element and the second portion laterally displaced within the multibeam unit cell from the first portion. One or both of the lateral displacement and an overall size of the optical mask element is configured to mitigate Moiréassociated with the optical mask element.


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