The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2024
Filed:
Dec. 16, 2021
Gerchberg Ophthalmic Dispensing, Pllc, New York, NY (US);
Okan Ersoy, West Lafayette, IN (US);
Wavefront Analysis Systems LLC, New York, NY (US);
Abstract
A totagram is produced by an iterative spectral phase recovery process resulting in complete information recovery using special masks, without a reference beam. Using these special masking systems reduce computation time, number of masks, and number of iterations. The special masking system is (1) a unity mask together with one or more bipolar binary masks with elements equal to 1 and −1, or (2) a unity mask together with one or more phase masks, or (3) a unity mask together with one pair of masks or more than one pair of masks having binary amplitudes of 0's and 1's, in which the masks in the pair are complementary to each other with respect to amplitude, or (4) one or more pairs of complementary masks with binary amplitudes of 0's and 1's without a unity mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile