The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2024
Filed:
Dec. 09, 2019
Applicant:
Enevate Corporation, Irvine, CA (US);
Inventors:
Benjamin Yong Park, Mission Viejo, CA (US);
Jill R. Pestana, Long Beach, CA (US);
Heidi Leighette Anderson, Newport Beach, CA (US);
Sung Won Choi, San Diego, CA (US);
Assignee:
ENEVATE CORPORATION, Irvine, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 4/1395 (2010.01); H01M 4/04 (2006.01); H01M 4/134 (2010.01); H01M 4/36 (2006.01); H01M 10/0525 (2010.01);
U.S. Cl.
CPC ...
H01M 4/1395 (2013.01); H01M 4/0447 (2013.01); H01M 4/134 (2013.01); H01M 4/366 (2013.01); H01M 10/0525 (2013.01);
Abstract
Methods of forming electrochemical cells are described. In some implementations, the method can include providing an electrochemical cell having an electrode with at least about 20% to about 99% by weight of silicon. The method can include providing a formation charge current at a first rate and at a second rate to the electrochemical cell. The first rate can be in a range from about C/100 to about C/10 and the second rate can be greater than about C/10.