The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2024

Filed:

May. 11, 2023
Applicant:

Auburn University, Auburn, AL (US);

Inventors:

Minseo Park, Waverly, AL (US);

Michael C. Hamilton, Auburn, AL (US);

Shiqiang Wang, Draper, UT (US);

Kosala Yapa Bandara, Hillsboro, OR (US);

Assignee:

Auburn University, Auburn, AL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 21/42 (2006.01); H01L 21/477 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7869 (2013.01); H01L 21/42 (2013.01); H01L 21/477 (2013.01); H01L 21/76868 (2013.01);
Abstract

A thin-film transistor comprises an annealed layer comprising crystalline zinc oxide. A passivation layer is adjacent to the thin-film transistor. The passivation layer has a thickness and material composition such that when a dose of radiation from a radiation source irradiates the thin-film transistor, a portion of the dose that includes an approximate maximum concentration of the dose is located within the annealed layer. The annealed layer has a thickness and threshold displacement energies after it has been annealed such that: a) a difference between a transfer characteristic value of the thin-film transistor before and after the dose is less than a first threshold; and b) a difference between a transistor output characteristic value of the thin-film before and after the dose is less than a second threshold. The thresholds are based on a desired performance of the thin-film transistor.


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