The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2024

Filed:

Jan. 29, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventor:

Vladimir Nagorny, Tracy, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 15/00 (2006.01); G05B 15/02 (2006.01); H01J 37/32 (2006.01); H01L 21/66 (2006.01); B01J 23/06 (2006.01); C03C 17/36 (2006.01); G01T 1/24 (2006.01); H01M 10/0525 (2010.01);
U.S. Cl.
CPC ...
H01L 22/12 (2013.01); G05B 15/02 (2013.01); H01J 37/32 (2013.01); H01J 37/32348 (2013.01); H01J 37/32926 (2013.01); H01J 37/32935 (2013.01); B01J 23/06 (2013.01); C03C 17/36 (2013.01); G01T 1/24 (2013.01); H01J 2237/24585 (2013.01); H01L 22/20 (2013.01); H01M 10/0525 (2013.01);
Abstract

A system and method including a processing device. The processing device receives data including a first set of plasma exposure values each associated with a respective plasma element of a plurality of plasma elements designed to generate plasma related fluxes. The processing device causes a plasma controller to activate the set of plasma elements based on the data to expose a substrate to the plasma related fluxes generated by the set of plasma elements during a plasma process. Each respective plasma element of the set of plasma elements is activated for a duration based on a respective plasma exposure value from the first plurality of plasma exposure values that is associated with the respective plasma element.


Find Patent Forward Citations

Nagorny, Vladimir. (2024). Image-based digital control of plasma processing (U.S. Patent No. 12027426). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12027426

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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