The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2024
Filed:
Sep. 01, 2022
Clo Virtual Fashion Inc., Seoul, KR;
Hohyun Lee, Seoul, KR;
Yeji Kim, Seoul, KR;
CLO Virtual Fashion Inc., Seoul, KR;
Abstract
A method and apparatus for simulating clothes receive a user setting for an area in which shirring is to be expressed in a two-dimensional (2D) pattern of clothes modeled with a mesh including a plurality of polygons, obtain a first line and a second line parallel to the first line from the area based on the user setting, generate inner lines that are perpendicular to at least one of the first line and the second line of the area between the first line and the second line and that have regular intervals, align polygons included in the area of the 2D pattern based on the inner lines, and perform a draping simulation of three-dimensional (3D) clothes corresponding to the 2D pattern in which the shirring is expressed by the aligned polygons.