The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2024
Filed:
Jan. 16, 2019
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Assignee:
LG Chem, Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/3504 (2014.01); C01B 33/12 (2006.01); G01N 1/40 (2006.01); G01N 1/44 (2006.01); G01N 33/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/3504 (2013.01); C01B 33/12 (2013.01); G01N 1/44 (2013.01); G01N 33/005 (2013.01); C01P 2004/61 (2013.01); C01P 2006/12 (2013.01); G01N 2001/4027 (2013.01);
Abstract
A method for quantitative analysis of hydrogen gas generated due to the decomposition of Si—OH (silanol) in porous silica, which is a support of a metallocene catalyst is provided. The analysis enables the measurement of the content of hydrogen present in trace amounts in silica by employing an inert gas fusion-infrared absorption (IGFIA) method under specific pressure and temperature conditions.