The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2024
Filed:
Feb. 10, 2020
Sac Industriale SA, Engelberg, CH;
Cesare Beretta, Castagnola, CH;
SAC INDUSTRIALE SA, Engelberg, CH;
Abstract
A reticular structure includes first elements distanced from each other and having an elongated conformation according to a first prevalent development trajectory, and second elements distanced from each other and having an elongated conformation according to a second prevalent development trajectory orthogonal, to the first prevalent development trajectory of the first elements. The first and second elements intersect at nodes to form meshes. The first elements have at a mid-portion defined between two consecutive nodes and orthogonally to the first prevalent development trajectory and a substantially T-shaped section including a base and a protuberance emerging orthogonally from the base. The second elements have, at a mid-portion defined between two immediately consecutive nodes and orthogonally to the second prevalent development path, a respective elongated base joined in a single piece to the base of the first elements to define a bottom surface of the reticular structure opposed to the protuberance of the first elements.