The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2024

Filed:

Nov. 11, 2021
Applicant:

Darwin Precisions Corporation, Hsinchu County, TW;

Inventors:

Chi-Wei Lin, Hsinchu County, TW;

Wen-Yi Lin, Hsinchu County, TW;

Assignee:

DARWIN PRECISIONS CORPORATION, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); C23C 14/02 (2006.01); C23F 1/02 (2006.01); C23F 1/04 (2006.01); C23F 1/14 (2006.01); C23F 1/16 (2006.01); C25F 3/16 (2006.01); G01N 21/57 (2006.01); G03F 1/60 (2012.01); C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
C23F 1/00 (2013.01); C23C 14/028 (2013.01); C23F 1/02 (2013.01); C23F 1/04 (2013.01); C23F 1/14 (2013.01); C23F 1/16 (2013.01); C25F 3/16 (2013.01); G01N 21/57 (2013.01); G03F 1/60 (2013.01); C23C 14/042 (2013.01);
Abstract

A method of preparing a metal mask substrate includes providing a metal substrate. Next, a gloss is measured and obtained from the surface of the metal substrate. Next, the gloss is determined whether to be within a predetermined range. When the gloss is determined within the predetermined range, a photolithography process is performed to the metal substrate, where the predetermined range is between 90 GU and 400 GU.


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Lin, Chi-Wei. (2024). Method of preparing metal mask substrate (U.S. Patent No. 12024780). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12024780

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