The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2024
Filed:
Oct. 25, 2019
Applicant:
Byk-chemie Gmbh, Wesel, DE;
Inventors:
Assignee:
BYK-Chemie GmbH, Wesel, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C04B 35/626 (2006.01); C04B 35/468 (2006.01); C04B 35/622 (2006.01); C04B 35/634 (2006.01); C04B 37/00 (2006.01); H01G 4/008 (2006.01); H01G 4/12 (2006.01); H01G 4/30 (2006.01);
U.S. Cl.
CPC ...
C04B 35/6264 (2013.01); C04B 35/468 (2013.01); C04B 35/62218 (2013.01); C04B 35/62655 (2013.01); C04B 35/63488 (2013.01); C04B 37/001 (2013.01); H01G 4/0085 (2013.01); H01G 4/1227 (2013.01); H01G 4/30 (2013.01); C04B 2235/3234 (2013.01); C04B 2235/6027 (2013.01); C04B 2235/606 (2013.01); C04B 2237/346 (2013.01);
Abstract
The invention relates to A slurry composition, comprising: an inorganic powder; a dispersant; and a solvent wherein the dispersant is a block copolymer comprising at least one hydrophobic block A and at least one hydrophilic block B, and wherein the blocks A and B comprise repeating units represented by the following general formula (I) wherein Ris selected from a hydrogen atom, a linear or branched alkyl group having 1 to 10 carbon atoms and a cyclic alkyl group having 4 to 6 carbon atoms, and wherein at least one carboxylic acid group or a salt thereof is covalently linked to the block copolymer.