The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2024

Filed:

Sep. 29, 2020
Applicant:

Uti Inc., Chungcheongnam-do, KR;

Inventors:

Jae Young Hwang, Gyeonggi-do, KR;

Hak Chul Kim, Chungcheongnam-do, KR;

Kukhyun Sunwoo, Gyeonggi-do, KR;

Tea Joo Ha, Chungcheongnam-do, KR;

Dong Moon Shin, Chungcheongnam-do, KR;

Jung Seok Woo, Chungcheongnam-do, KR;

Assignee:

UTI INC., , KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); C03C 21/00 (2006.01); H05K 5/00 (2006.01);
U.S. Cl.
CPC ...
C03C 15/00 (2013.01); C03C 21/002 (2013.01); C03C 2218/34 (2013.01); H05K 5/0017 (2013.01);
Abstract

A method of manufacturing a flexible cover window is proposed. The flexible cover window includes a planar part and a folded part extending continuously from the planar part, wherein the folded part is thinner than the planar part. The method includes: forming a photoresist layer on a glass substrate, patterning the photoresist layer to form a gradation resist pattern layer for forming the folded part on the glass substrate, forming the folded part having an inclined portion formed between the folded part and the planar part using the gradation resist pattern layer as a mask, removing the gradation resist pattern layer, and reinforcing the glass substrate.


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