The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2024

Filed:

Jul. 10, 2017
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Yasushi Takai, Echizen, JP;

Noriaki Hamaya, Echizen, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01F 17/259 (2020.01); C01F 17/218 (2020.01); C01F 17/265 (2020.01); C23C 4/10 (2016.01); C23C 4/134 (2016.01);
U.S. Cl.
CPC ...
C01F 17/259 (2020.01); C01F 17/218 (2020.01); C01F 17/265 (2020.01); C23C 4/10 (2013.01); C23C 4/134 (2016.01); C01P 2004/61 (2013.01);
Abstract

Provided is a slurry for suspension plasma spraying, which is a spray material used for suspension plasma spraying in an atmosphere including an oxygen-containing gas, contains 5-40 mass % of rare earth fluoride particles having a maximum particle diameter (D100) of 12 μm or less, and contains one or more types of solvent selected from among water and organic solvents. A rare earth acid fluoride-containing sprayed film, in which process shift and particle generation hardly occur, can be stably formed on a base material by carrying out suspension plasma spraying in an atmosphere including an oxygen-containing gas. A spraying member provided with this sprayed film exhibits excellent corrosion resistance to halogen-based gas plasma.


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