The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2024
Filed:
Jun. 03, 2021
Olympus Corporation, Tokyo, JP;
Koji Yamaoka, Hamura, JP;
Yuma Kasuya, Fuchu, JP;
Shinya Torii, Tokyo, JP;
Keita Kimura, Hachioji, JP;
Kunitoshi Hiraga, Tama, JP;
Takefumi Uesugi, Tachikawa, JP;
OLYMPUS CORPORATION, Tokyo, JP;
Abstract
An insufflation system having a processor configured to calculate a first target gas feeding flow rate based on a difference between a body cavity internal pressure and an insufflation target pressure of a body cavity, determine whether the first target gas feeding flow rate is lower than a threshold gas feeding flow rate, and in response to determining that the first target gas feeding flow rate is lower than the threshold gas feeding flow rate, feed gas at a second target gas feeding flow rate by controlling a first valve provided at a gas feeding conduit and a second valve provided at a suction conduit, wherein the processor is configured to cause the suction conduit to suction at a first suction flow rate, and wherein the second target gas feeding flow rate is obtained by adding the first suction flow rate to the first target gas feeding flow rate.