The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2024
Filed:
Aug. 10, 2021
Samsung Electronics Co., Ltd., Suwon-si, KR;
Sukhwa Jang, Suwon-si, KR;
Kanguk Kim, Seoul, KR;
Hyunsuk Noh, Suwon-si, KR;
Yeongshin Park, Seoul, KR;
Sangkyu Sun, Seoul, KR;
Sunyoung Lee, Yongin-si, KR;
Sohyang Lee, Seoul, KR;
Hongjun Lee, Suwon-si, KR;
Hosun Jung, Gimpo-si, KR;
Jeongmin Jin, Suwon-si, KR;
Jeonghee Choi, Seoul, KR;
Jinseo Choi, Hwaseong-si, KR;
Cera Hong, Hwaseong-si, KR;
Abstract
A method of manufacturing a semiconductor device includes forming a lower structure including a plurality of transistors, forming a conductive layer on the lower structure, forming first preliminary pad mask patterns and wiring mask patterns on the conductive layer, forming pad mask patterns by patterning the first preliminary pad mask patterns while protecting the wiring mask patterns, and etching the conductive layer using the pad mask patterns and the wiring mask patterns as an etching mask to form pad patterns and wiring patterns.