The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2024
Filed:
May. 26, 2021
Applicant:
Inplay, Inc., Irvine, CA (US);
Inventors:
Ruifeng Liu, Irvine, CA (US);
Russell Mohn, Santa Ana, CA (US);
Assignee:
INPLAY, INC., Irvine, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H03F 3/217 (2006.01); H03F 1/56 (2006.01); H03F 3/193 (2006.01); H03F 3/24 (2006.01);
U.S. Cl.
CPC ...
H03F 3/245 (2013.01); H03F 1/565 (2013.01); H03F 3/193 (2013.01); H03F 3/2171 (2013.01); H03F 2200/171 (2013.01); H03F 2200/451 (2013.01);
Abstract
A class-D RF power amplifier (PA) architecture with duty cycle control has improved power efficiency while suppressing even-order harmonics. An inductor and capacitor (LC) low pass filter (LPF) can also be integrated on-chip to further suppress harmonics and provide impedance transformation between the PA and load. This eases the design for customers and reduce their bill of materials cost. The LPF can also match the PA to the load impedance to improve efficiency. The harmonic levels can also be controlled by adjusting the duty cycle of the PA output.