The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2024

Filed:

Jun. 04, 2021
Applicant:

Anhui Sanan Optoelectronics Co., Ltd., Wuhu, CN;

Inventors:

Yu Wang, Wuhu, CN;

Chiahao Tsai, Wuhu, CN;

Qin Wang, Wuhu, CN;

Bin Fang, Wuhu, CN;

Liangliang Gui, Wuhu, CN;

Jinkuang Dong, Wuhu, CN;

Shan Wang, Wuhu, CN;

Zhaoming Huang, Wuhu, CN;

Chih-Chung Chiu, Wuhu, CN;

Chi-ming Tsai, Wuhu, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 33/00 (2010.01); H01L 33/04 (2010.01); H01L 33/22 (2010.01); H01L 33/32 (2010.01); H01L 33/38 (2010.01);
U.S. Cl.
CPC ...
H01L 33/32 (2013.01); H01L 33/0075 (2013.01); H01L 33/0095 (2013.01); H01L 33/04 (2013.01); H01L 33/22 (2013.01); H01L 33/382 (2013.01); H01L 2933/0016 (2013.01);
Abstract

The disclosure illustrates a composite substrate and a method for manufacturing the same, the method including: disposing a mask layer on an upper surface of a substrate; forming a plurality of mask patterns spaced apart from each other to form a plurality of intervals thereamong; filling a dummy metallic material into the intervals; removing the mask patterns to form a mesh-like dummy metallic layer; and removing the dummy metallic layer while depositing a nitride layer so as to form a mesh-like structure confined by the nitride layer and the substrate. The disclosure also illustrates a method for manufacturing a light-emitting device using the composite substrate.


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